Optical Communication Applicat

Industrial Laser and Optical A


SOI Wafers


Product Introduction


SOI Wafers

SOI(Silicon on Insulator)Wafer is a silicon wafer which is a structured single crystalized layer on oxidized layer and used in the field of high speed LSI, low power LSI, powerdevice, MEMS.



Size4” 6” 8”
Device layer thickness100nm※~200μm
Wafer in Wafer thickness accuracyThin layer ±15nm Thick layer ±0.5μm
BOXlayer thicknessMaximum 20μm

※Thin thickness device layer products is a corroborated products which is manufactured with Shin-Etsu who has a thin device layer making technology and KST’s thick oxidized technology combined together.


Example of the use of Thick-BOX® SOI Wafer


KST service as a wafer foundry providing various services to deposit films on silicon wafers meeting customers’ needs since the establishment of 1998 throughout. Our deposition process service include oxide film, which enjoys the highest demand in the industry today ,and nitride film. In addition, we respond to the diverse needs of customers by creating films of different thickness, from common thin films to thick ones.

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